Please use this identifier to cite or link to this item: http://dspace.utpl.edu.ec/handle/123456789/18727
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dc.contributor.authorStashans, A.es_ES
dc.contributor.authorVillamagua Conza, L.es_ES
dc.date.accessioned2017-06-16T22:02:16Z-
dc.date.available2016-11-14es_ES
dc.date.available2017-06-16T22:02:16Z-
dc.date.submitted21/12/2016es_ES
dc.identifierdoi: 10.1063/1.4968832es_ES
dc.identifier.isbn21583226es_ES
dc.identifier.otherdoi: 10.1063/1.4968832es_ES
dc.identifier.urihttp://dspace.utpl.edu.ec/handle/123456789/18727-
dc.description.abstractWe propose an explanation for the origin of n-type electrical conductivity in SnO2 based on the results obtained from the DFT+U simulations. Two competitive intrinsic point defects, namely oxygen vacancy and hydrogen impurity, have been considered at different positions within the crystalline lattice in order to find out the equilibrium configurations and to analyze corresponding density of states (DOS) patterns along with the electron localization function (ELF). It has been demonstrated that hydrogen could be solely responsible for the n-type conductivity whereas the oxygen vacancy appears to have not a notable influence upon it. The computational analysis is backed up by some experimental data for undoped tin dioxidees_ES
dc.languageIngléses_ES
dc.subjectSnO2es_ES
dc.subjectH-dopinges_ES
dc.subjectDFTes_ES
dc.titleDoping of SnO2 with H atoms: An alternative way to attain n-type conductivityes_ES
dc.typeArticlees_ES
dc.publisherAIP Advanceses_ES
Appears in Collections:Artículos de revistas Científicas

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